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Custom Gas Purifier Systems

Pall purifier systems enable the removal of molecular contamination to sub-parts-per-billion (ppb) levels from a variety of gases used in the semiconductor, photovoltaic, LED and display industries. They are well suited for applications such as bulk delivery and gas bottle filling.
  • Flow rates up to 4,000 slpm (141 scfm)
  • Purifier assemblies contain integral particle filters
  • Isolation valves allow for easy replacement of individual assemblies
  • Custom configurations available to meet specific customer requirements

Products on this page may be covered by one or more patents, including US 7,465,692

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描述

Pall purifier systems enable the removal of molecular contamination to sub-parts-per-billion (ppb) levels from a variety of gases used in the semiconductor, photovoltaic, LED and display industries. They are well suited for applications such as bulk delivery and gas bottle filling.
  • Flow rates up to 4,000 slpm (141 scfm)
  • Purifier assemblies contain integral particle filters
  • Isolation valves allow for easy replacement of individual assemblies
  • Custom configurations available to meet specific customer requirements

Products on this page may be covered by one or more patents, including US 7,465,692

Specifications

 
 
Purifiable Gases and Removal Efficiency See Table 1
Materials
  • All wetted surfaces are electropolished 316L stainless steel (except for the purification material)
  • ≤ 0.25 μm / 10 μin Ra internal surface finish
  • Housings meet or exceed VIM / VAR specifications
Particle Removal Rating1
  • ≥ 0.4 μm (3 nm particle filter assemblies Removal available as stand-alone units)
Housing Pressure Ratings
  • Standard pressure: 1.7 MPa (250 psig)
  • High pressure: 20.7 MPa (3,000 psig)
Configurations
  • Manifold contains 1 to 4 assemblies to accommodate flow rates up to 4,000 slpm (141 scfm)
  • Available with customer specific connections and components
Certifications
  • ASME: Vessel is designed and manufactured in accordance with the ASME BPVC Section III, Div 1 and is U-stamped
  • PED: Available for most categories of gases
Leak Rating
  • Assemblies are 100% helium leak tested to 1 x 10-9 atm-cm3/s
 
1 Particle rating is based on laboratory testing with NaCl aerosol.

Nominal Dimensions

Table 1: List of Purifiable Gases

 
Gas Purifier Material Code Effluent Material Specification2
Nitrogen, argon, helium, xenon, krypton, neon INP <1 ppb H2O, O2, CO2 and CO
Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether SIP <1 ppb H2O, O2, CO2 and CO
Carbon monoxide SIP <1 ppb H2O, O2, CO2, Ni(CO)4 and Fe(CO)5
Fluoromethane, diflouromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane FCP <1 ppb H2O, O2, and CO2
Germane GEH4P <1 ppb H2O, O2, and CO2
Sulfur hexafluoride SF6P <1 ppb H2O, O2, and CO2
Air, carbon dioxide, oxygen, nitrous oxide OXP <10 ppb H2O
Boron trichloride, chlorine, trichlorosilane, dichlorosilane CLXP <100 ppb H2O
Hydrogen chloride HCLP <15 ppb H2O
Hydrogen bromide HBRP <50 ppb H2O
Photolithography clean dry air CDAP <1 ppb H2O,
<1 ppb organics (as C4),
<10 ppt acid gases (as SO2),
<15 ppt basic gases (as NH3),
<1 ppt refractory compounds (as HMDSO)
 
2 Gas specific data available upon request.

Type

Systems

Application

Process gas purification, Process gas purification

Segments

Photovoltaics, Semiconductor, Display

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